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National Repository of Grey Literature 2 records found  Search took 0.01 seconds. 
Combined Electron Beam Lithography
 Krátký, Stanislav ; Mikulík, Petr (referee) ; Škereň,, Marek (referee) ; Kolařík, Vladimír (advisor)
This thesis deals with grayscale e-beam lithography and diffractive optical elements fabrication. Three topics are addressed. The first topic is combined grayscale e-beam lithography. The goal of this task is combining exposures performed by two systems with various beam energies. This combined technique leads to a better usage of both systems because various structures can be more easily prepared by one electron beam energy than by the other. The next topic is the optimization of shape borders of exposing structures that are defined by image input. The influence of such optimization on exposure data preparation is evaluated, as well as the exposure time and the change of optical properties of testing structures. The possibility of deep multilevel diffractive optical element fabrication in plexiglass blocks is researched as the third topic. Plexiglass can replace the system of a resist and a substrate. A new approach to writing down the structures by electron beam is presented, minimizing thermal stress on the plexiglass block during the exposure. The writing method also improves the homogeneity of exposed motifs. A method for computing the exposure dose for specific multilevel structures was designed. This method is based on the existing model of proximity effect computation and it minimizes the computing time necessary to obtain the exposure doses.
Detailed record
Combined Electron Beam Lithography
 Krátký, Stanislav ; Mikulík, Petr (referee) ; Škereň,, Marek (referee) ; Kolařík, Vladimír (advisor)
This thesis deals with grayscale e-beam lithography and diffractive optical elements fabrication. Three topics are addressed. The first topic is combined grayscale e-beam lithography. The goal of this task is combining exposures performed by two systems with various beam energies. This combined technique leads to a better usage of both systems because various structures can be more easily prepared by one electron beam energy than by the other. The next topic is the optimization of shape borders of exposing structures that are defined by image input. The influence of such optimization on exposure data preparation is evaluated, as well as the exposure time and the change of optical properties of testing structures. The possibility of deep multilevel diffractive optical element fabrication in plexiglass blocks is researched as the third topic. Plexiglass can replace the system of a resist and a substrate. A new approach to writing down the structures by electron beam is presented, minimizing thermal stress on the plexiglass block during the exposure. The writing method also improves the homogeneity of exposed motifs. A method for computing the exposure dose for specific multilevel structures was designed. This method is based on the existing model of proximity effect computation and it minimizes the computing time necessary to obtain the exposure doses.
Detailed record

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